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High-NA EUV
Technology
Lithography
The ~$380M next step: bigger optics, finer features, halved field size.
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High-numerical-aperture EUV (0.55 NA) resolves ~8 nm features in one exposure. Intel took the first production tools for its 14A roadmap; TSMC adopts more cautiously. Each system ships in multiple aircraft and costs around $380M — the most complex machine ever sold.
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Record reviewed as of 2026-01-15 — see Methodology.