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Home › Technologies › EUV Lithography

EUV Lithography

Technology Lithography

13.5-nanometer light from exploding tin droplets — the machine behind every leading-edge chip.

You're looking at a technology record: a building block of AI hardware — what it does, who makes it, and which chips and systems use it.

Extreme-ultraviolet lithography fires lasers at tin droplets 50,000 times a second to make plasma that emits 13.5 nm light, steered by the flattest mirrors ever manufactured. Only ASML builds these ~$180M machines; every chip on this site below 7 nm depends on them, and their export to China is banned — making one Dutch factory the choke point of the entire AI supply chain.

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ASML EUV ↗

Record reviewed as of 2026-01-15 — see Methodology.