{"data":{"slug":"high-na-euv","etype":"tech","name":"High-NA EUV","cat":"Lithography","subtitle":"The ~$380M next step: bigger optics, finer features, halved field size.","summary":"High-numerical-aperture EUV (0.55 NA) resolves ~8 nm features in one exposure. Intel took the first production tools for its 14A roadmap; TSMC adopts more cautiously. Each system ships in multiple aircraft and costs around $380M — the most complex machine ever sold.","attrs":null,"kf":null,"aliases":["High NA","EXE:5200"],"ticker":null,"exchange":null,"hq":null,"founded":null,"website":null,"status":null,"region":null,"asof":"2026-01-15","sources":[{"url":"https://www.asml.com/en/products/euv-lithography-systems","label":"ASML High-NA"}]},"meta":{"found":true,"count":1,"served_from":"site cache (no live upstream calls)","as_of":"2026-10-14T04:57:40+00:00","disclaimer":"Research and information only — not investment advice. Structured records carry basis labels (vendor spec / reported / estimate); market quotes are delayed/indicative.","attribution":"Records compiled from vendor documentation, official filings and reputable public reporting; market quotes via financial data providers. See /data-sources."}}